Country’s First Ultra-Edge Tech-Based Semiconductor Plant to Come Up in Chhattisgarh
Chhattisgarh chief minister Vishnu Deo Sai on Friday laid the foundation stone for the country’s first Gallium Nitride (GaN)-based semiconductor fabrication unit in Nava Raipur
Raipur: In a landmark initiative for India’s semiconductor and electronic manufacturing landscape, Chhattisgarh chief minister Vishnu Deo Sai on Friday laid the foundation stone for the country’s first Gallium Nitride (GaN)-based semiconductor fabrication unit in Nava Raipur.
Commercial production from the ultra-edge technology-based semiconductor plant will commence from April- May 2026.
Developed by Polymatech Electronics Limited with an investment of Rs 1,143 crore, the state-of-the-art facility will produce high frequency GaN chips designed to operate between 5.925 GHz and 13.75 GHz, catering to the advanced 5G and 6G telecommunications infrastructure and marking a major milestone in India’s technological journey.
The plant aims to manufacture 10 billion chips annually by 2030, with potential to generate thousands of direct jobs and lakhs of indirect employment opportunities, a spokesman of the Chhattisgarh government said.
The project is expected to attract Foreign Direct Investment (FDI) and boost regional economic development, the spokesman said.
“This is not just a plant; it is the identity of new Chhattisgarh”, the chief minister said while laying the foundation stone for the plant.
He said the prime goal of his government is not only to attract investment but to ensure that youth from tribal, rural and backward regions receive technical training and become active participants in India’s technological revolution.
Polymatech will handle the advanced packaging of these high-frequency chips at the Raipur facility, which will also serve as a hub for innovation of RF systems, defense electronics, artificial intelligence, data analytics, and high- performance computing.
GaN is globally recognized as a super alternative to silicon in high-power, high-frequency applications, due to its efficiency, thermal performance, and durability.
The establishment of this facility marks India’s entry into a high-value, strategic segment of the global semiconductor market, the spokesman said.
